top of page

VACUUM DEPOSITION SYSTEMS

Magnetron Sputtering

Magnetron Sputtering_edited.jpg

Magnetron sputtering employs plasma to generate ions which bombard the surface of a ‘target’ which then sputters the thin film material on to a substrate. Ranvac Technologies offers a range of circular and linear magnetron sputter sources, engineered to meet R&D and production requirements.

R&D Systems with Thermal Evaporation
research-and-development.png
bottom of page